超純水加熱器系列產(chǎn)品是本公司為滿足先進半導體制程中的超純水加熱需求而設計的解決方案。它不僅適用于半導體晶圓制造和高規(guī)格的先進封裝過程，而且在以下多個關鍵制程中發(fā)揮著重要作用：
濕法清洗：在單片及槽式清洗制程中，用于去除表面污染，確保晶圓清潔。
光刻工藝：提供恒溫超純水以清洗硅片，保證光刻膠性能。
刻蝕工藝：在化學或等離子體刻蝕中，通過溫控超純水調(diào)節(jié)刻蝕過程，以提高精度和均勻性。
化學機械研磨（CMP）：通過調(diào)節(jié)研磨液的溫度，影響研磨速率和均勻性。
晶體生長與晶圓切割：在晶體生長階段進行溫度調(diào)節(jié)，以及在晶圓切割中去除碎屑和熱量
此外，超純水加熱器也廣泛應用于其他行業(yè)，包括醫(yī)療、制藥、化學實驗室和分析儀器、微電子和納米技術、電力行業(yè)，以滿足這些領域?qū)Ω呒兌群途_溫度控制的嚴格要求。
Wet Cleaning: Used in single wafer and batch cleaning processes to remove surface contaminants, ensuring wafer cleanliness.
Photolithography: Provides temperature-controlled ultra-pure water for wafer cleaning, crucial for maintaining photoresist performance.
Etching Process: In chemical or plasma etching, temperature-controlled ultra-pure water is used to regulate the etching process, enhancing precision and uniformity.
Chemical Mechanical Polishing (CMP): Adjusts the temperature of the polishing slurry, impacting the rate and uniformity of polishing.
Crystal Growth and Wafer Slicing: Utilized for temperature regulation during crystal growth and for removing debris and heat during wafer slicing.
ultra-pure water heater is also extensively used in other industries, including medical, pharmaceutical, chemical, laboratory and analytical instrumentation, microelectronics and nanotechnology, and the power sector, to meet the high standard requirements for purity and precise temperature control.
